A new single crystal silicon carbide (SiC)
MEMS fabrication process is developed using a proton-implantation smart-cut
technique. A 6H-SiC layer with 1.3 µm thickness has been achieved over an
oxidized silicon substrate using the proposed technique. TEM analyses of the
silicon carbide thin film reveal single crystal characteristics, which is
attractive for potential integration of MEMS devices with high-temperature
microelectronics in the same structural layer for harsh environment
applications. Implant-induced defect density in the silicon carbide can be
substantially reduced to a negligible level through high-temperature annealing.
Prototype single crystal 6H-SiC MEMS devices, such as strain sensors, have been
successfully fabricated as demonstration vehicles for future harsh-environment
micro-system implementation.
Source:IOPscience
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